實驗名稱：氣流(liu)輔助靜電(dian)聚焦電(dian)流(liu)體噴頭(tou)實驗(yan)研究(jiu)

　　測試設備：高壓放大器、函(han)數發生器、精密流量泵、激光(guang)共聚焦(jiao)顯(xian)微鏡和超(chao)景深(shen)光(guang)學顯(xian)微鏡等(deng)。

　　實驗過程：

　　圖(tu)1：實(shi)(shi)驗平臺(tai)：(a)實(shi)(shi)驗平臺(tai)示意(yi)圖(tu)；(b)實(shi)(shi)驗平臺(tai)實(shi)(shi)物圖(tu)

　　實(shi)驗中使用的(de)(de)(de)實(shi)驗平(ping)(ping)臺如圖(tu)1所示(shi)。基板安(an)裝(zhuang)在(zai)(zai)運(yun)動(dong)(dong)(dong)平(ping)(ping)臺上(shang)(shang)(shang)，噴(pen)(pen)頭(tou)安(an)裝(zhuang)在(zai)(zai)運(yun)動(dong)(dong)(dong)平(ping)(ping)臺正上(shang)(shang)(shang)方，軟件(jian)(jian)(jian)(jian)控(kong)(kong)制電(dian)(dian)機帶動(dong)(dong)(dong)運(yun)動(dong)(dong)(dong)平(ping)(ping)臺進(jin)行(xing)運(yun)動(dong)(dong)(dong)。通過軟件(jian)(jian)(jian)(jian)可(ke)以對(dui)(dui)平(ping)(ping)臺的(de)(de)(de)運(yun)動(dong)(dong)(dong)速(su)度、運(yun)動(dong)(dong)(dong)軌(gui)跡及噴(pen)(pen)頭(tou)高(gao)(gao)(gao)度等進(jin)行(xing)調節，打(da)印圖(tu)案的(de)(de)(de)位圖(tu)文件(jian)(jian)(jian)(jian)和運(yun)動(dong)(dong)(dong)軌(gui)跡文件(jian)(jian)(jian)(jian)均可(ke)導入(ru)(ru)到平(ping)(ping)臺軟件(jian)(jian)(jian)(jian)中，軟件(jian)(jian)(jian)(jian)對(dui)(dui)文件(jian)(jian)(jian)(jian)進(jin)行(xing)讀取后(hou)直接控(kong)(kong)制運(yun)動(dong)(dong)(dong)平(ping)(ping)臺進(jin)行(xing)預定圖(tu)案的(de)(de)(de)運(yun)動(dong)(dong)(dong)，從而實(shi)現各(ge)種定制圖(tu)案的(de)(de)(de)打(da)印。精(jing)密流(liu)(liu)量泵對(dui)(dui)噴(pen)(pen)頭(tou)進(jin)行(xing)溶液供(gong)給。氣泵對(dui)(dui)噴(pen)(pen)頭(tou)進(jin)行(xing)氣流(liu)(liu)供(gong)給，通過調節調壓(ya)(ya)閥(fa)對(dui)(dui)輸入(ru)(ru)噴(pen)(pen)頭(tou)的(de)(de)(de)氣流(liu)(liu)壓(ya)(ya)力進(jin)行(xing)控(kong)(kong)制，同時(shi)(shi)噴(pen)(pen)頭(tou)氣流(liu)(liu)入(ru)(ru)口處設置有(you)氣壓(ya)(ya)表用于(yu)實(shi)時(shi)(shi)監(jian)測其氣壓(ya)(ya)的(de)(de)(de)變化以保證氣壓(ya)(ya)的(de)(de)(de)穩定，所使用的(de)(de)(de)是調壓(ya)(ya)閥(fa)和數顯氣壓(ya)(ya)表。高(gao)(gao)(gao)壓(ya)(ya)電(dian)(dian)源為噴(pen)(pen)頭(tou)各(ge)電(dian)(dian)機提供(gong)高(gao)(gao)(gao)壓(ya)(ya)，高(gao)(gao)(gao)壓(ya)(ya)電(dian)(dian)源由函(han)數信號(hao)發(fa)生(sheng)(sheng)器(qi)和高(gao)(gao)(gao)壓(ya)(ya)放大(da)器(qi)組成(cheng)，函(han)數信號(hao)發(fa)生(sheng)(sheng)器(qi)用于(yu)產生(sheng)(sheng)各(ge)種形式(shi)（直流(liu)(liu)、交流(liu)(liu)、脈沖等）的(de)(de)(de)電(dian)(dian)壓(ya)(ya)信號(hao)，高(gao)(gao)(gao)壓(ya)(ya)放大(da)器(qi)將函(han)數信號(hao)發(fa)生(sheng)(sheng)器(qi)輸出的(de)(de)(de)電(dian)(dian)壓(ya)(ya)信號(hao)放大(da)（1000倍）后(hou)輸出到噴(pen)(pen)頭(tou)的(de)(de)(de)高(gao)(gao)(gao)壓(ya)(ya)電(dian)(dian)極上(shang)(shang)(shang)。實(shi)驗平(ping)(ping)臺上(shang)(shang)(shang)設置有(you)觀測相機對(dui)(dui)打(da)印的(de)(de)(de)實(shi)時(shi)(shi)情(qing)況進(jin)行(xing)觀測。對(dui)(dui)打(da)印在(zai)(zai)基板上(shang)(shang)(shang)的(de)(de)(de)實(shi)驗結果(guo)采(cai)用顯微鏡(jing)進(jin)行(xing)觀測，所使用的(de)(de)(de)包括激光(guang)共(gong)聚焦顯微鏡(jing)和超景深光(guang)學顯微鏡(jing)。

　　實驗結果：

　　圖2：絕緣基(ji)板銀(yin)漿打(da)印結果(guo)：(a)常規電(dian)流體(ti)噴(pen)印打(da)印結果(guo)；(b)噴(pen)頭靜電(dian)聚焦功(gong)能打(da)印結果(guo)；(b)線寬隨基(ji)板速(su)度變(bian)化

　　常(chang)規電(dian)流(liu)體噴(pen)印(yin)(yin)在(zai)絕(jue)(jue)緣(yuan)的(de)PI膜(mo)基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)上(shang)打(da)(da)印(yin)(yin)的(de)結(jie)(jie)果如圖2(a)所示(shi)，受基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)的(de)影(ying)響，打(da)(da)印(yin)(yin)的(de)銀(yin)(yin)漿(jiang)呈現彎曲狀態，調節噴(pen)嘴距基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)的(de)距離也不能解決這種問題。靜電(dian)聚焦電(dian)流(liu)體噴(pen)印(yin)(yin)實驗中使用半(ban)徑為(wei)20μm的(de)玻(bo)(bo)璃噴(pen)嘴并采用納(na)米(mi)銀(yin)(yin)漿(jiang)溶液(ye)打(da)(da)印(yin)(yin)在(zai)絕(jue)(jue)緣(yuan)聚酰亞胺(PI)基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)和玻(bo)(bo)璃基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)上(shang)。采用的(de)靜電(dian)透(tou)鏡(jing)結(jie)(jie)構是(shi)內徑為(wei)2.2mm的(de)電(dian)極膜(mo)片結(jie)(jie)構。圖2(b)顯(xian)示(shi)了(le)(le)納(na)米(mi)銀(yin)(yin)漿(jiang)溶液(ye)在(zai)玻(bo)(bo)璃基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)和PI基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)上(shang)的(de)打(da)(da)印(yin)(yin)結(jie)(jie)果。圖2(c)顯(xian)示(shi)了(le)(le)打(da)(da)印(yin)(yin)的(de)銀(yin)(yin)漿(jiang)溶液(ye)的(de)線寬(kuan)隨(sui)基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)運動(dong)速度(du)的(de)增大而減小，在(zai)基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)速度(du)為(wei)300mm/s時(shi)，在(zai)PI基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)上(shang)的(de)線寬(kuan)能到達20μm，在(zai)玻(bo)(bo)璃基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)上(shang)的(de)線寬(kuan)能到達10μm。這顯(xian)示(shi)了(le)(le)噴(pen)頭采用靜電(dian)聚焦功能時(shi)在(zai)絕(jue)(jue)緣(yuan)基(ji)(ji)(ji)(ji)板(ban)(ban)(ban)(ban)上(shang)具有(you)良(liang)好的(de)打(da)(da)印(yin)(yin)效果。

　　圖(tu)3：傾斜基板上打印結果：(a)打印過程(cheng)觀測圖(tu)；(b)誤差系數(shu)隨傾斜角度的變化

　　為(wei)(wei)證明靜(jing)(jing)(jing)(jing)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)聚(ju)(ju)(ju)焦功能(neng)的(de)(de)(de)(de)(de)噴(pen)(pen)頭(tou)(tou)能(neng)在(zai)(zai)傾(qing)(qing)斜(xie)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)提高打(da)(da)印(yin)(yin)(yin)精(jing)度，進行實驗比(bi)較(jiao)靜(jing)(jing)(jing)(jing)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)聚(ju)(ju)(ju)焦電(dian)(dian)(dian)(dian)(dian)(dian)(dian)流(liu)體(ti)(ti)噴(pen)(pen)頭(tou)(tou)和(he)常(chang)規電(dian)(dian)(dian)(dian)(dian)(dian)(dian)流(liu)體(ti)(ti)噴(pen)(pen)印(yin)(yin)(yin)在(zai)(zai)傾(qing)(qing)斜(xie)的(de)(de)(de)(de)(de)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)的(de)(de)(de)(de)(de)打(da)(da)印(yin)(yin)(yin)效果，如圖(tu)3所示(shi)。為(wei)(wei)了便于(yu)相(xiang)機觀測，實驗使(shi)用(yong)(yong)(yong)半徑為(wei)(wei)150μm的(de)(de)(de)(de)(de)金屬噴(pen)(pen)嘴(zui)并采(cai)用(yong)(yong)(yong)納米銀漿溶液(ye)打(da)(da)印(yin)(yin)(yin)在(zai)(zai)傾(qing)(qing)斜(xie)的(de)(de)(de)(de)(de)導(dao)(dao)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)硅(gui)基(ji)(ji)(ji)板(ban)(ban)(ban)和(he)絕(jue)緣聚(ju)(ju)(ju)酰亞胺(PI)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)。采(cai)用(yong)(yong)(yong)的(de)(de)(de)(de)(de)靜(jing)(jing)(jing)(jing)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)透(tou)鏡結(jie)構(gou)是內徑為(wei)(wei)4mm的(de)(de)(de)(de)(de)藍寶石片結(jie)構(gou)。打(da)(da)印(yin)(yin)(yin)所采(cai)用(yong)(yong)(yong)的(de)(de)(de)(de)(de)參(can)數(shu)(shu)如圖(tu)3(a)和(he)(b)所示(shi)，在(zai)(zai)導(dao)(dao)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)硅(gui)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)打(da)(da)印(yin)(yin)(yin)時，常(chang)規電(dian)(dian)(dian)(dian)(dian)(dian)(dian)流(liu)體(ti)(ti)噴(pen)(pen)印(yin)(yin)(yin)中(zhong)(zhong)噴(pen)(pen)嘴(zui)與(yu)基(ji)(ji)(ji)板(ban)(ban)(ban)之(zhi)間(jian)形成(cheng)的(de)(de)(de)(de)(de)傾(qing)(qing)斜(xie)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)場造成(cheng)了射流(liu)很明顯(xian)的(de)(de)(de)(de)(de)偏移(yi)。而靜(jing)(jing)(jing)(jing)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)聚(ju)(ju)(ju)焦電(dian)(dian)(dian)(dian)(dian)(dian)(dian)流(liu)體(ti)(ti)噴(pen)(pen)頭(tou)(tou)中(zhong)(zhong)，靜(jing)(jing)(jing)(jing)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)透(tou)鏡對電(dian)(dian)(dian)(dian)(dian)(dian)(dian)場的(de)(de)(de)(de)(de)聚(ju)(ju)(ju)焦作使(shi)射流(liu)的(de)(de)(de)(de)(de)偏移(yi)明顯(xian)的(de)(de)(de)(de)(de)減小(xiao)。其中(zhong)(zhong)ds表(biao)示(shi)射流(liu)與(yu)噴(pen)(pen)頭(tou)(tou)中(zhong)(zhong)心(xin)線(xian)(xian)在(zai)(zai)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)落點(dian)之(zhi)間(jian)的(de)(de)(de)(de)(de)距離，hs表(biao)示(shi)噴(pen)(pen)頭(tou)(tou)中(zhong)(zhong)心(xin)線(xian)(xian)在(zai)(zai)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)的(de)(de)(de)(de)(de)落點(dian)與(yu)噴(pen)(pen)頭(tou)(tou)之(zhi)間(jian)的(de)(de)(de)(de)(de)距離，并將誤(wu)差系(xi)數(shu)(shu)(ds/hs)作為(wei)(wei)在(zai)(zai)傾(qing)(qing)斜(xie)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)打(da)(da)印(yin)(yin)(yin)誤(wu)差的(de)(de)(de)(de)(de)評估。實驗結(jie)果如圖(tu)3(c)所示(shi)，在(zai)(zai)導(dao)(dao)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)硅(gui)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)，靜(jing)(jing)(jing)(jing)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)聚(ju)(ju)(ju)焦電(dian)(dian)(dian)(dian)(dian)(dian)(dian)流(liu)體(ti)(ti)噴(pen)(pen)頭(tou)(tou)的(de)(de)(de)(de)(de)誤(wu)差系(xi)數(shu)(shu)(ds/hs)明顯(xian)小(xiao)于(yu)常(chang)規電(dian)(dian)(dian)(dian)(dian)(dian)(dian)流(liu)體(ti)(ti)噴(pen)(pen)印(yin)(yin)(yin)的(de)(de)(de)(de)(de)誤(wu)差系(xi)數(shu)(shu)。在(zai)(zai)絕(jue)緣的(de)(de)(de)(de)(de)PI(相(xiang)對介電(dian)(dian)(dian)(dian)(dian)(dian)(dian)常(chang)數(shu)(shu)為(wei)(wei)3.5)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)，常(chang)規電(dian)(dian)(dian)(dian)(dian)(dian)(dian)流(liu)體(ti)(ti)噴(pen)(pen)印(yin)(yin)(yin)很難實現穩(wen)定的(de)(de)(de)(de)(de)打(da)(da)印(yin)(yin)(yin)。靜(jing)(jing)(jing)(jing)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)聚(ju)(ju)(ju)焦電(dian)(dian)(dian)(dian)(dian)(dian)(dian)流(liu)體(ti)(ti)噴(pen)(pen)頭(tou)(tou)不僅能(neng)實現穩(wen)定的(de)(de)(de)(de)(de)打(da)(da)印(yin)(yin)(yin)而且(qie)具(ju)有(you)比(bi)硅(gui)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)打(da)(da)印(yin)(yin)(yin)的(de)(de)(de)(de)(de)更(geng)小(xiao)的(de)(de)(de)(de)(de)誤(wu)差系(xi)數(shu)(shu)，在(zai)(zai)基(ji)(ji)(ji)板(ban)(ban)(ban)傾(qing)(qing)斜(xie)角(jiao)度小(xiao)于(yu)30°時誤(wu)差系(xi)數(shu)(shu)小(xiao)于(yu)0.03。這表(biao)明噴(pen)(pen)頭(tou)(tou)的(de)(de)(de)(de)(de)采(cai)用(yong)(yong)(yong)靜(jing)(jing)(jing)(jing)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)聚(ju)(ju)(ju)焦功能(neng)時在(zai)(zai)絕(jue)緣和(he)傾(qing)(qing)斜(xie)的(de)(de)(de)(de)(de)基(ji)(ji)(ji)板(ban)(ban)(ban)上(shang)具(ju)有(you)更(geng)高的(de)(de)(de)(de)(de)打(da)(da)印(yin)(yin)(yin)精(jing)度。

　　高(gao)壓放大器推薦(jian)：ATA-7050

　　圖：ATA-7050高壓放大器指標參數

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